AMAT 0010-54703 Reflexion® LK CMP System

AMAT 0010-54703 Reflexion® LK CMP System

Product Introduction

• Description: The Reflexion LK CMP system by Applied Materials is a leading 300mm Chemical Mechanical Planarization (CMP) platform, optimized for performance and productivity in three-step CMP applications.
• Features: Incorporates advanced polishing, cleaning, and drying technologies. Includes a unique three-platen sequential polishing platform and an integrated post-CMP Desica® cleaner with Marangoni™ vapor drying technology to minimize watermark defects and particle contamination.

Technical Specifications

• Platform: 300mm CMP
• Polishing: Three-platen sequential polishing
• Cleaning: Integrated post-CMP Desica® cleaner
• Drying Technology: Marangoni™ vapor drying
• Endpoint Methods: FullVision® XE and RTPC XE in-situ endpoint and profile control systems
• Metrology: In-line metrology and advanced process control capabilities
• Real-time Control: Patented window-in-pad technology for accurate real-time polish control
• Sensing Technology: Broadband spectroscopy or Hall-Effect eddy current sensing

Our Services

1、 All our products are new and original, and of good quality.

2、  Our prices are very competitive.

3、  We have a large quantity in stock, so we could help the customers to get the components which are difficult to get.

4、  All inquiries will be valued and will reply in 24 hours.

5、  Fast shipping, and good after-sale service

6、  We will ship the items within 1-3 working days after the payment is received.

7、 Good package to protect the products.  

Packing & Delivery

1)100% brand New and Original Factory Seal!

2)Warranty: 1 year

3)Package: Original packing with cartons.

4)Delivery time: Shipped in 3-7 days after payment
 

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